Radiation hard pixel sensors using high-resistive wafers in a 150 nm CMOS processing line

Authors: 
Ivan Dario Caicedo Sierra
D.-L. Pohl, T. Hemperek, I. Caicedo, L. Gonella, F. Hügging, J. Janssen, H. Krüger, A. Macchiolo, N. Owtscharenko, L. Vigani and N. Wermes
Published In: 
https://doi.org/10.1088/1748-0221/12/06/P06020

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